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Effect of molecular weight distribution on e-beam exposure properties of polystyreneKUMAR DEY, Ripon; BO CUI.Nanotechnology (Bristol. Print). 2013, Vol 24, Num 24, issn 0957-4484, 245302.1-245302.5Article

A method for fabricating below 22nm feature patterns in quartz moldTERASAKI, Atsunori; SEKI, Junichi; ONO, Haruhito et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69211N.1-69211N.9, issn 0277-786X, isbn 978-0-8194-7106-2Conference Paper

A single-step process for making nanofluidic channels using electron beam lithographyPEARSON, J. L; CUMMING, D. R. S.Microelectronic engineering. 2005, Vol 78-79, pp 343-348, issn 0167-9317, 6 p.Conference Paper

Destruction of Solid C60F18 by Electron BeamSHNITOV, V. V; MIKOUSHKIN, V. M; GORDEEV, YU. S et al.Fullerenes, nanotubes, and carbon nanostructures (Print). 2010, Vol 18, Num 1-6, pp 446-449, issn 1536-383X, 4 p.Conference Paper

Modeling resist heating in mask fabrication using a multi-layer Green's function approachDACHEN CHU; PEASE, R. Fabian W; GOODSON, Kenneth E et al.SPIE proceedings series. 2002, isbn 0-8194-4435-9, 2Vol, vol 1, 206-212Conference Paper

Advanced electron beam resist requirements and challengesJAMIESON, Andrew; YONG KWAN KIM; OLSON, Bennett et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 816616.1-816616.15, 2Conference Paper

Multi-adduct derivatives of C60 for electron beam nano-resistsTADA, Tetsuya; UEKUSA, Koichiro; PHILLIPS, Marcus et al.Microelectronic engineering. 2002, Vol 61-62, pp 737-743, issn 0167-9317Conference Paper

Resolution Limits of Electron-Beam Lithography toward the Atomic ScaleMANFRINATO, Vitor R; LIHUA ZHANG; DONG SU et al.Nano letters (Print). 2013, Vol 13, Num 4, pp 1555-1558, issn 1530-6984, 4 p.Article

Uniformity measurement of electron emission from carbon nanotubes using electron beam resistLEE, J. H; LEE, S. H; LEE, H. J et al.LEE, H. J et al.International Vacuum Nanoelectronics Conference. 2004, pp 56-57, isbn 0-7803-8397-4, 1Vol, 2 p.Conference Paper

High molecular weight polystyrene as very sensitive electron beam resistCON, Celal; DEY, Ripon; FERGUSON, Mark et al.Microelectronic engineering. 2012, Vol 98, pp 254-257, issn 0167-9317, 4 p.Conference Paper

The trouble starts with using electrons - Putting charging effect correction models to the testWANDEL, Timo; UTZNY, Clemens; NAKAYAMADA, Noriaki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81661C.1-81661C.10, 2Conference Paper

Two Complementary Methods to Characterize Long Range Proximity Effects due to Develop LoadingSUNDBERG, Linda K; WALLRAFF, Greg M; FRIZ, Alexander M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 78230G.1-78230G.10, 2Conference Paper

High Throughput Maskless Lithography : Low Voltage versus High VoltageSTEENBRINK, S. W. H. K; KAMPHERBEEK, B. J; LE-DENMAT, J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69211T.1-69211T.10, issn 0277-786X, isbn 978-0-8194-7106-2Conference Paper

Difference between initial distributions of proton and counter anion in chemically amplified electron-beam resistKOZAWA, Takahiro; YAMAMOTO, Hiroki; SAEKI, Akinori et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 615314.1-615314.9Conference Paper

A chemically amplified calix[4]arene-based electron-beam resistSAILER, H; RUDERISCH, A; KERN, D. P et al.Microelectronic engineering. 2004, Vol 73-74, pp 228-232, issn 0167-9317, 5 p.Conference Paper

Metallic air-bridges on non-planar transport structuresBORZENKO, T; LEHMANN, F; SCHMIDT, G et al.Microelectronic engineering. 2003, Vol 67-68, pp 720-727, issn 0167-9317, 8 p.Conference Paper

Amplitude and spatial frequency characterization of line edge roughness using CD-SEMEYTAN, Guy; DROR, Ophir; ITHIER, Laurent et al.SPIE proceedings series. 2002, isbn 0-8194-4435-9, 2Vol, vol 1, 347-355Conference Paper

Monte carlo model of charging in resists in e-beam lithographyKO, Yeong-Uk; JOY, David C.SPIE proceedings series. 2001, pp 544-551, isbn 0-8194-4030-2Conference Paper

ZnO nanowires strips growth: Template reliability and morphology studyPEA, M; MAIOLO, L; PILLOTON, R et al.Microelectronic engineering. 2014, Vol 121, pp 147-152, issn 0167-9317, 6 p.Article

Functional oxide nanostructures written by EBL on insulating single crystal substrates : Nanolithography 2012MALOWNEY, J; MESTRES, N; BORRISE, X et al.Microelectronic engineering. 2013, Vol 110, pp 94-99, issn 0167-9317, 6 p.Conference Paper

Patterning of Si nanowire array with electron beam lithography for sub-22 nm Si nanoelectronics technology : Nanolithography 2012SUN, Min-Chul; GARAM KIM; JUNG HAN LEE et al.Microelectronic engineering. 2013, Vol 110, pp 141-146, issn 0167-9317, 6 p.Conference Paper

Hybrid Resist Systems Based on α-Substituted Acrylate CopolymersITO, Hiroshi; SUNDBERG, Linda K; BOZANO, Luisa et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72733H.1-72733H.12, 2Conference Paper

Fabrication and optical properties of periodical structures based on a water-developable and tunable La0.7Sr0.3MnO3 resistWU, Ming-Chung; CHUANG, Chih-Min; CHEN, Yang-Fang et al.Journal of material chemistry. 2008, Vol 18, Num 7, pp 780-785, issn 0959-9428, 6 p.Article

Nickel pulse reversal plating for image reversal of ultrathin electron beam resistAWAD, Yousef; LAVALLEE, Eric; BEAUVAIS, Jacques et al.Thin solid films. 2007, Vol 515, Num 5, pp 3040-3045, issn 0040-6090, 6 p.Article

Exploring the fundamental limit of CD control : shot noise and CD uniformity improvement through resist thicknessYU, Ming L; SAGLE, Allan; BULLER, Benny et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-5853-8, 2Vol, Part 1, 42-51Conference Paper

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